发明名称 |
PROTECTIVE LAYER TO ENABLE DAMAGE FREE GAP FILL |
摘要 |
PURPOSE: A protective layer to enable damage free gap fill is provided to perform fill so that a void or a weak area is not left unfilled without damage to a specific part. CONSTITUTION: A protective layer to enable damage free gap fill is comprised of the steps: proving some specific part with higher density than others and some specific part with lower density than others on a substrate(301); depositing a protective layer on a specific part(303); depositing a dielectric layer to partially fill a gap of a high aspect ratio(305); and etching a substrate to remove a deposition material from to decrease aspect ratio of the gap at the specific part with a high density.
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申请公布号 |
KR20090119661(A) |
申请公布日期 |
2009.11.19 |
申请号 |
KR20080075899 |
申请日期 |
2008.08.04 |
申请人 |
NOVELLUS SYSTEMS, INC. |
发明人 |
VAN SCHRAVENDIJK BART;HILL RICHARD S.;VAN DEN HOEK WILBERT;TE NIJENHUIS HARALD |
分类号 |
H01L21/76;H01L21/205;H01L21/3065 |
主分类号 |
H01L21/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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