DICHROIC MIRROR, METHOD OF MANUFACTURING THE SAME, AND LITHOGRAPHY DEVICE, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING THE DEVICES

摘要

PROBLEM TO BE SOLVED: To provide a dichroic mirror configured such that infrared radiation is removed from an optical path toward a wafer.

SOLUTION: The dichroic mirror is configured such that first type radiation in a first wavelength range having a high limit is separated from second type radiation in a second wavelength range having a low limit higher than the high limit of first wavelengths. The mirror includes a substrate, a reflecting surface facing the direction opposite to the substrate, and at least one laminate having the width which increases in tiers in the direction of going to a substrate. The laminate is formed of layers alternating a first material and a second material on the substrate. The reflecting surface has steps having the width which is wider than the high limit of the first wavelengths and is narrower than the low limit of second wavelengths.

COPYRIGHT: (C)2010,JPO&INPIT