| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a heating device capable of efficiently forming a film on a glass substrate, and to provide a film forming apparatus with the heating device. Ž<P>SOLUTION: The film forming apparatus has the heating device for vertically spraying high-temperature gas higher than the softening point temperature of a glass substrate to a surface 25 of the glass substrate 24 placed on a supporting rack 26, and simultaneously sprays gas for deposition 43 decomposed by heating along with the high-temperature gas to deposit a film onto the surface of the glass substrate. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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