发明名称 Messverfahren und Messeinrichtung für eine Plasmaversorgungseinrichtung
摘要 The apparatus has a register (350) for storing an automatic gain control (AGC) value for one section having an AGC signal and a voltage gain controller (360) for generating a voltage gain control value (361) in another section having an reception enable signal. The voltage gain control value is generated even in an initial frame transmission section by the AGC value detected in the previous section. The generated voltage gain control value is transferred to a voltage gain amplifier (320) and converted to analog using a digital to analog converter (370) and input to a voltage gain amplifier. An independent claim is also included for a method of controlling voltage gain in an ultra wideband receiving apparatus.
申请公布号 DE112008000115(A5) 申请公布日期 2009.11.19
申请号 DE20081100115T 申请日期 2008.06.27
申请人 HUETTINGER ELEKTRONIK GMBH + CO. KG 发明人 HINTZ, GERD;KIRCHMEIER, THOMAS
分类号 H01J37/32 主分类号 H01J37/32
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