| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device, capable of accurately controlling movement of a photosensitive substrate at high speed. <P>SOLUTION: The device comprises a substrate stage ST which supports a plate P by one or more support parts having a predetermined flatness; a lighting system IL which emits exposing light to a supported area supported by the support parts of the plate P, and a moving mechanism 20 which holds and moves the plate P relative to the support parts and relatively displaces an irradiation area with the exposing light on the plate P and the plate P. <P>COPYRIGHT: (C)2010,JPO&INPIT |
