发明名称 BAND ENGINEERED HIGH-K TUNNEL OXIDES FOR NON-VOLATILE MEMORY
摘要 A non-volatile memory cell that has a charge source region, a charge storage region, and a crested tunnel barrier layer that has a potential energy profile which peaks between the charge source region and the charge storage region. The tunnel barrier layer has multiple high-K dielectric materials, either as individual layers or as compositionally graded materials.
申请公布号 US2009283816(A1) 申请公布日期 2009.11.19
申请号 US20080120715 申请日期 2008.05.15
申请人 SEAGATE TECHNOLOGY LLC 发明人 TIAN WEI;JIN INSIK;DIMITROV DIMITAR V.;XUE SONG S.
分类号 H01L29/788 主分类号 H01L29/788
代理机构 代理人
主权项
地址