Magnetron sputtering source

摘要

At least two elongate targets (3) are arranged side by side with a gap which is substantially smaller than the width of the targets. Each of the targets is provided with its own electrical connection (5). Anodes (7) are preferably positioned between the targets. Independent claims are given for a coating chamber with the proposed magnetron sputtering source, a vacuum coating installation with such a coating chamber, a method for operating the coating installation, and an application of a magnetron sputtering source or a coating chamber or a coating installation covered by these claims.