| 摘要 |
PROBLEM TO BE SOLVED: To provide an image sensor which improves a light emission rate by forming a gapless microlens, and also to provide a manufacturing method thereof. SOLUTION: The image sensor includes: a semiconductor substrate 10 including pixels; an interlayer insulating film 11 formed on the semiconductor substrate 10 and including a metal wiring; a color filter layer 30 and a planarizing layer 40 formed on the interlayer insulating film 11; and seed microlenses formed on the planarizing layer 40, wherein the seed microlenses are formed so as to be separated from or to contact with an adjacent seed microlens. COPYRIGHT: (C)2008,JPO&INPIT
|
