发明名称 ULTRA-HIGH PURITY NIPT ALLOYS AND SPUTTERING TARGETS COMPRISING SAME
摘要 <p>A manufacturing method of ultra-high purity NiPt alloys is provided to considerably reduce the manufacturing cost of an alloy with a high Pt concentration as compared with powder metallurgy by easily manufacturing the ultra-high purity NiPt alloys without requiring special equipment or capital investment, the ultra-high purity NiPt alloys manufactured by the method are provided, and sputtering targets comprising the ultra-high purity NiPt alloys are provided. A manufacturing method of a ultra-high purity NiPt alloy with a minimum purity of 4N5 comprises the steps of: (a) heating predetermined quantities of less pure Ni and Pt at an elevated temperature within a crucible made from materials that are inert to the melt at an elevated temperature to form an NiPt alloy melt; and (b) moving the melt to a mold in which a cavity is formed, the cavity having a surface coated with a releasing agent to prevent the contamination of the surface with impurity elements.</p>
申请公布号 KR20090010854(A) 申请公布日期 2009.01.30
申请号 KR20070105354 申请日期 2007.10.19
申请人 HERAEUS, INC. 发明人 HUI JUN;LI SHINHWA;LONG DAVID;DERRINGTON CARL;KUNKEL BERND
分类号 C23C14/34 主分类号 C23C14/34
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