RESIST COMPOSITION AND PATTERNING PROCESS

摘要

PURPOSE: A resist composition and a patterning process using the same are provided to exhibit excellent water repellency and water slip and forms a pattern with few development defects when processed by immersion lithography. CONSTITUTION: A resist composition comprises a polymer compound(P1) containing a repeating unit represented by formulae 1a and 2a as an essential unit; a polymer compound which has a maleic anhydride-derived skeleton and/or any one or all of a lactone ring and hydroxyl group, and is soluble in an alkaline developing solution by action of acids; a compound generating an acid by exposure of high energy beam; and a organic solvent.