发明名称 Lithographic apparatus and device manufacturing method
摘要 The present invention relates to a method for calibrating a grating of an encoder measurement system between two adjacent calibrated locations, the method includes moving one of a sensor object including an encoder-type sensor and a grating along the other one of the sensor object and the grating with a speed, wherein the speed is selected such that disturbances in the grating substantially extending over a distance smaller than a distance between the two calibrated locations can not or only partly be followed by the one of the sensor object and the grating, and measuring during the moving the position of the sensor object with respect to the grating at a plurality of locations between the two calibrated locations.
申请公布号 US7619207(B2) 申请公布日期 2009.11.17
申请号 US20060594230 申请日期 2006.11.08
申请人 ASML NETHERLANDS B.V. 发明人 LOOPSTRA ERIK ROELOF;EUSSEN EMIEL JOZEF MELANIE;VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS;LOOPSTRA ONNO BRAM
分类号 G21G5/00;H03M1/48 主分类号 G21G5/00
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