发明名称 Device and method for localized underfill
摘要 A device and method for localizing underfill includes a substrate, a plurality of dies, and underfill material. The substrate includes a plurality of contacts and a plurality of cavities separated by a plurality of mesas. The plurality of dies is mounted to the substrate using the plurality of contacts. The underfill material is located between the substrate and the dies. The underfill material is localized into a plurality of regions using the mesas. Each of the contacts is located in a respective one of the cavities. In some embodiments, the substrate further includes a plurality of channels interconnecting the cavities. In some embodiments, the substrate further includes a plurality of intra-cavity mesas for further localizing the underfill material. In some embodiments, outer edges of a first one of the dies rest on first mesas located on edges of a first one of the cavities.
申请公布号 US9349614(B2) 申请公布日期 2016.05.24
申请号 US201414453413 申请日期 2014.08.06
申请人 Invensas Corporation 发明人 Wang Liang;Katkar Rajesh;Woychik Charles G.;Uzoh Cyprian Emeka
分类号 H01L21/44;H01L21/56;H01L25/065;H01L23/31;H01L25/00 主分类号 H01L21/44
代理机构 Haynes and Boone, LLP 代理人 Haynes and Boone, LLP
主权项 1. A semiconductor package, the package comprising: a substrate comprising a plurality of contacts and a plurality of cavities separated by a plurality of mesas, each of the contacts being located in a respective one of the cavities; a plurality of dies mounted to the substrate using the plurality of contacts; a plurality of channels interconnecting the cavities; and an underfill material between the substrate and the dies; wherein the underfill material is localized into a plurality of regions using the mesas.
地址 San Jose CA US
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