Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same

摘要

A liquid chemical for forming a water repellent protecting film on a wafer having at its surface an uneven pattern and containing at least one kind of element selected from the group consisting of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized by including: a water repellent protecting film forming agent; and water, and characterized in that the water repellent protecting film forming agent is at least one selected from compounds represented by the following general formula [1] and salt compounds thereof and that the concentration of the water relative to the total quantity of a solvent contained in the liquid chemical is not smaller than 50 mass %.;

主权项

1. A process for cleaning a wafer having an uneven pattern at its surface, the wafer containing at least one element selected from the group consisting of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, comprising at least the steps of:
(a) forming a water repellent protecting film, wherein a liquid chemical for forming a protecting film is retained at least in the recessed portions of the uneven pattern; (b) removing a liquid from the uneven pattern by drying; and (c) removing the protecting film; wherein the liquid chemical for forming a protecting film includes a water repellent protecting film forming agent and water, wherein the water repellent protecting film forming agent is at least one selected from compounds represented by formula [1] and salt compounds thereof, and wherein the concentration of the water relative to the total quantity of a solvent contained in the liquid chemical is not smaller than 50 mass %; wherein R1 represents a C1-C18 monovalent hydrocarbon group the hydrogen elements of which are partially or entirely replaced with fluorine, R2 mutually independently represents a monovalent organic group having a C1-C18 hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with fluorine, and “a” is an integer of from 0 to 2.