发明名称 Lithographic apparatus.
摘要 A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radiation that is different from the first predetermined wavelength of radiation. The second regions are arranged to be substantially opaque, diffractive, or reflective to the first predetermined wavelength of radiation and substantially transparent to the second predetermined wavelength of radiation.
申请公布号 NL1036695(A1) 申请公布日期 2009.11.17
申请号 NL20091036695 申请日期 2009.03.11
申请人 ASML NETHERLANDS B.V. 发明人 WOUTER ANTHON SOER;MAARTEN MARINUS JOHANNES WILHELMUS VAN HERPEN
分类号 G03F7/20;G21K1/06 主分类号 G03F7/20
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