FILM FORMING COMPOSITION FOR NANOIMPRINTING, PROCESS FOR PRODUCTION OF STRUCTURES, AND STRUCTURES

摘要

The invention provides a film-forming composition for nanoimprinting which permits high-precision pattern transfer from a mold and is excellent in the close adhesion to a substrate and the peelability of a mold; a process for the production of structures which brings about an efficient and effective improvement in the thermal stability of structures; a process for the production of structures which makes it possible to obtain a structure even at a relatively low pressing pressure; and structures obtained by the processes. It is preferable either to use a silsesquioxane resin comprising specific constituent units as the film-forming composition or to incorporate a low-molecular-weight siloxane resin having a mass-average molecular weight of 300 to 5000 into the composition. Further, after the peeling of a mold in the production of a structure, it is preferable to irradiate the resin layer with ultraviolet light under a reduced pressure.