发明名称 RADIATION SOURCE, AND LITHOGRAPHY APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation source which is configured to generate extreme ultraviolet rays. <P>SOLUTION: The radiation source includes: a plasma forming site located at a position where a laser radiation beam contacts fuel to form a plasma; a collector which collects the extreme ultraviolet rays formed in the plasma forming site, thereby forming an extreme ultraviolet ray beam; a contamination barrier having a plurality of foils at least part of which is located between the plasma forming site and the collector; and a rotatable base connected with the plurality of foils operatably. The rotatable base is so configured that the laser radiation beam passes through the contamination barrier and reaches the plasma forming site. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009267408(A) 申请公布日期 2009.11.12
申请号 JP20090103512 申请日期 2009.04.22
申请人 ASML NETHERLANDS BV 发明人 SOER WOUTER ANTHON;WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES;JAK MARTIN JACOBUS JOHAN
分类号 H01L21/027 主分类号 H01L21/027
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