| 摘要 |
The invention provides a process for production of a transistor and an organic semiconductor element which allows satisfactory formation of active layers on desired surfaces, even if the active layers are organic semiconductor compound-containing active layers imparted with prescribed properties beforehand. A preferred mode of the process for production of a transistor is a process for production of a transistor provided with a source electrode and drain electrode, an active layer containing an organic semiconductor compound as a current channel between the electrodes, a gate electrode that controls the current flowing through the current channel and an insulating layer disposed between the active layer and gate electrode, wherein the process includes a pasting step in which a working liquid is situated between the active layer and insulating layer and the active layer and insulating layer are attached together.
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