发明名称 FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <p>PURPOSE: A fluid handing structure, a lithography apparatus, and a method for manufacturing a device are provided to increase a meniscus breakdown speed. CONSTITUTION: A fluid handling structure has a plurality of openings(50) arranged in a cornered shape(52) on the plane. The openings are orientated to the substrate or a substrate table to support the substrate. The cornered shape has a side with a negative radius and a corner with the radius between 0.05 and 4.0 mm.</p>
申请公布号 KR20090117662(A) 申请公布日期 2009.11.12
申请号 KR20090040458 申请日期 2009.05.08
申请人 ASML NETHERLANDS B.V. 发明人 DIRECKS DANIEL JOZEF MARIA;PHILIPS DANNY MARIA HUBERTUS;VAN DEN DUNGEN CLEMENS JOHANNES GERARDUS;STEFFENS KOEN;VAN PUTTEN ARNOLD JAN
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址