发明名称 |
FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
<p>PURPOSE: A fluid handing structure, a lithography apparatus, and a method for manufacturing a device are provided to increase a meniscus breakdown speed. CONSTITUTION: A fluid handling structure has a plurality of openings(50) arranged in a cornered shape(52) on the plane. The openings are orientated to the substrate or a substrate table to support the substrate. The cornered shape has a side with a negative radius and a corner with the radius between 0.05 and 4.0 mm.</p> |
申请公布号 |
KR20090117662(A) |
申请公布日期 |
2009.11.12 |
申请号 |
KR20090040458 |
申请日期 |
2009.05.08 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DIRECKS DANIEL JOZEF MARIA;PHILIPS DANNY MARIA HUBERTUS;VAN DEN DUNGEN CLEMENS JOHANNES GERARDUS;STEFFENS KOEN;VAN PUTTEN ARNOLD JAN |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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