| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method, a phase grating and a device for analyzing the wave surface of a light beam. <P>SOLUTION: The method is provided for analyzing the wave surface of the light beam F from a light source S to the focus of a lens O<SB>1</SB>. The beam F irradiates a sample LA placed on an analysis plane P<SB>D</SB>and having a defect D<SB>1</SB>. A diffraction grating GR of a plane P<SB>C</SB>is arranged in a conjugate position of the analysis plane P<SB>D</SB>through focal systems O<SB>2</SB>, O<SB>3</SB>, O<SB>4</SB>. An image is formed in a plane P<SB>S</SB>at a distance d from the grating plane GR and analyzed by a processing means UT. The grating GR is encoded by a phase function resulting from the combination of two phase functions which are a first excluding function of defining a meshing of useful zones transmitting the beam to be analyzed in the form of light pencil beams, and a second phase fundamental function of creating a phase opposed state between two light pencil beams coming out of adjacent meshes of the exclusion grating. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
