SPUTTERING TARGET MATERIAL FOR MANUFACTURING Ni-W-P,Zr-BASED INTERMEDIATE LAYER FILM IN PERPENDICULAR MAGNETIC RECORDING MEDIUM AND THIN FILM MANUFACTURED BY USING THE TARGET MATERIAL

摘要

PROBLEM TO BE SOLVED: To provide: an alloy for a Ni-W-P,Zr-based intermediate layer film in a perpendicular magnetic recording medium; a sputtering target material for manufacturing a thin film; and a thin film manufactured by using the target material. SOLUTION: The sputtering target material for manufacturing a Ni-W-P,Zr-based intermediate layer film in a perpendicular magnetic recording medium includes, by atomic percentage, W in an amount of 1-20% and P and/or Zr in an amount of 0.1-10% in total with the balance being Ni. The sputtering target material is obtained by solidification molding of a raw material powder manufactured by a gas atomizing method, and the Ni-W-P,Zr-based thin film is manufactured by using the sputtering target material. COPYRIGHT: (C)2010,JPO&INPIT