发明名称 METHODS OF FABRICATING INTERCONNECT STRUCTURES CONTAINING VARIOUS CAPPING MATERIALS FOR ELECTRICAL FUSE AND OTHER RELATED APPLICATIONS
摘要 Methods are provided for fabricating interconnect structures containing various capping materials for electrical fuses and other related applications. The method includes forming a first interconnect structure having a first interfacial structure and forming a second interconnect structure adjacent to the first structure. The second interconnect structure is formed with a second interfacial structure different from the first interfacial structure of the first interconnect structure.
申请公布号 US2009280636(A1) 申请公布日期 2009.11.12
申请号 US20080118161 申请日期 2008.05.09
申请人 HSU LOUIS L;TONTI WILLIAM R;YANG CHIH-CHAO 发明人 HSU LOUIS L.;TONTI WILLIAM R.;YANG CHIH-CHAO
分类号 H01L21/4763 主分类号 H01L21/4763
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