REMOVAL OF DEPOSITION ON AN ELEMENT OF A LITHOGRAPHIC APPARATUS

摘要

The invention provides a cleaning process for the removal of deposition on an element of a lithographic apparatus. The method includes (ex situ) treating the element with an alkaline cleaning liquid. In this way, Sn may be removed from a contaminant barrier or a collector mirror. Especially beneficial is the application of a voltage to the element to be cleaned and/or by using complexing agents for improving the dissolution of Sn in the cleaning liquid.