发明名称 ELECTRON BEAM IRRADIATING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an electron beam irradiating device that has eliminated window materials for partition, and collectively irradiates a sample with low-speed electron beams that are released from a planar electron source and have the same energy. Ž<P>SOLUTION: This electron beam irradiating device includes a vacuum vessel, an electron source array that is arranged in the vacuum vessel and releases planar electron beams, and a sample stand that is arranged in the vacuum vessel and directly faces the electron source array. A negative voltage is applied to the sample stand of an electron release electrode of the electron source array, and electron beams released from the electron source array are accelerated towards the sample and radiated to it. The negative voltage is -10 keV or lower, and has variable voltage value, and allows radiation of extremely-low-speed electron beams. The electron source array is larger than the sample stand, and the electron beams can be collectively radiated to the sample. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009264869(A) 申请公布日期 2009.11.12
申请号 JP20080113604 申请日期 2008.04.24
申请人 HITACHI LTD 发明人 KUSUNOKI TOSHIAKI
分类号 G21K5/04;G21K1/00 主分类号 G21K5/04
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