| 发明名称 |
COLD-PRESSED SPUTTER TARGETS |
| 摘要 |
A sputter target includes a sputter material made of an alloy or a material mixture composed of at least two components which are in a state of thermodynamic disequilibrium. The components are compacted by an isostatic or uniaxial cold-pressing process.
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| 申请公布号 |
US2009277777(A1) |
申请公布日期 |
2009.11.12 |
| 申请号 |
US20070296462 |
申请日期 |
2007.05.30 |
| 申请人 |
W.C. HERAEUS GMBH |
发明人 |
SCHULTHEIS MARKUS;WEIGERT MARTIN |
| 分类号 |
C23C14/00;B32B27/04;C23C14/14 |
主分类号 |
C23C14/00 |
| 代理机构 |
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