SELF-ALIGNED REPAIRING PROCESS FOR BARRIER LAYER

摘要

A self-aligned repairing process for a barrier layer is provided. A repair layer is formed by chemical vapor deposition using an organometallic compound as a precursor gas. The precursor gas adsorbed on a dielectric layer exposed by defects in a barrier layer is transformed to an insulating metal oxide layer, and the precursor gas adsorbed on the barrier layer is transformed to a metal layer.

主权项

1. A damascene structure, comprising:
a dielectric layer disposed on a substrate and having a damascene opening; a barrier layer disposed on the dielectric layer having the damascene opening, and comprising two portions separated by a defect; a repair layer comprising:
a conductive portion disposed on the two portions of the barrier layer; andan insulating portion disposed in the defect; and a seed layer conformally disposed on the repair layer.