发明名称 3D TWO-PHOTON LITHOGRAPHIC MICROFABRICATION SYSTEM
摘要 An imaging system is provided that includes a optical pulse generator for providing an optical pulse having a spectral bandwidth and includes monochiromatic waves having different wavelengths. A dispersive element receives a second optical pulse associated with the optical pulse and disperses the second optical pulse at different angles on the surface of the dispersive element depending on wavelength. One or more focal elements receives the dispersed second optical pulse produced on the dispersive element. The one or more focal element recombine the dispersed second optical pulse at a focal plane on a specimen where the width of the optical pulse is restored at the focal plane.
申请公布号 US2009278058(A1) 申请公布日期 2009.11.12
申请号 US20090431254 申请日期 2009.04.28
申请人 KIM DAEKEUN;SO PETER T C 发明人 KIM DAEKEUN;SO PETER T.C.
分类号 G21G5/00 主分类号 G21G5/00
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