| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a scanning exposure device and a scanning exposure method capable of blocking light for exposure by selectively using a light shield member to shield a region of minimum non-exposure width and efficiently shielding the entire pattern region of a mask. <P>SOLUTION: Each light shield unit 14 has four light shield members, i.e. first light shield members 60 and 60 whose width w1 in a conveyance direction is less than the minimum non-exposure width wNR, a second light shield member 61 whose width (w) in the conveyance direction is larger than that of the first light shield member 60, and a third light shield member 62 whose width w3 in the conveyance direction is larger than the width w2 of the second light shield member 61. In a state wherein a substrate W is conveyed below the mask M, the plurality of light shield members 60, 60, 61, and 62 shield the entire area of a pattern P of the mask M from light, and while the first light shield member 60 is moved in synchronism with the conveyance of the substrate W to form the non-exposure region NR of the minimum non-exposure width wNR, the substrate W is exposed. <P>COPYRIGHT: (C)2010,JPO&INPIT |
