| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern formation method capable of forming a fine pattern simply and effectively. <P>SOLUTION: The pattern formation method for forming a prescribed pattern on a substrate includes: (1) a step of obtaining a first resist pattern formed with part of the prescribed pattern; (2) a step of forming a mask layer for a first etching, which is provided with a first resist pattern and a first coating layer coating the first resist pattern; (3) a step of etching the substrate; (4) a step of obtaining a second resist pattern, in which at least part of the pattern of the remaining of the prescribed pattern is formed; (5) a step of forming a mask layer for a second etching provided with a second resist pattern and a second coating layer for coating the second resist pattern; (6) and a step of performing further etching process. The processes (4) to (6) are repeated one time or more in this order. <P>COPYRIGHT: (C)2010,JPO&INPIT |
