| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a scanning exposure device capable of exposing simultaneously a repetition exposure area and a nonrepetitive exposure area by the one scanning exposure device. <P>SOLUTION: This scanning exposure device is provided with a substrate conveying mechanism 10 capable of conveying a substrate W having the repetition exposure area and the nonrepetitive exposure area along a prescribed direction, an irradiation part 13 for irradiating the substrate W with an exposing light EL, a mask holding part 11 for holding a mask M for exposing the repetition exposure area of the substrate W, while irradiated with the exposing light EL, and a direct drawing part 14 for drawing-exposing the nonrepetitive exposure area of the substrate W, using one part of the exposing light EL from the irradiation part 13 for irradiating the mask M. <P>COPYRIGHT: (C)2010,JPO&INPIT |
