| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an improved bearing. <P>SOLUTION: A lithography device includes a bearing configured to support a first part, e.g., a reticle masking device so that the first part is movable in a first direction (z) with respect to a second part of the device and movable in a second direction (y) with respect to the second part. The bearing passively supports the first part at three degrees of freedom (z, Rx, and Ry). By this, the first part is coupled with at least one permanent magnet, and the second part is coupled with at least two permanent magnets. The permanent magnet of the first part is disposed substantially between the mutual permanent magnets of the second part. The orientation of these permanent magnets is substantially parallel with the first direction. The permanent magnet of the first part has opposite polarity substantially to at least one of the magnets of the second part. Furthermore, the lithography device can include an actuator that actively controls the movement of the first part when coupled with a control system at the three degrees of freedom (x, y and/or Rz). <P>COPYRIGHT: (C)2010,JPO&INPIT |
