| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum deposition apparatus which does not take a very long time in operations such as vacuuming or opening to atmosphere although a vacuum apparatus generally takes a very long time in such operations when a film is deposited on each of a plurality of surfaces of a work to be film-deposited or a thick film is deposited only on an arbitrary surface of the work to be film-deposited in a high vacuum environment. SOLUTION: The vacuum deposition apparatus has two self-rotating mechanisms of a first self-rotating mechanism 9 and a second self-rotating mechanism 13. The first self-rotating mechanism 9 has a mechanism wherein self-rotation is performed by a fixed angle step in response to the angle between teeth of a first self-rotating gear 6 during revolution by a revolution mechanism, and the second self-rotating mechanism 13 has a mechanism wherein a second self-rotating gear 10 lacking one tooth to the first self-rotating gear 6 is used, self-rotation is performed by an angle step in response to the angle between teeth, and a work to be film-deposited is allowed to face an evaporation source 2 at a position where one tooth of the second self-rotating gear 10 is removed. COPYRIGHT: (C)2010,JPO&INPIT
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