Monitoring a Discharge in a Plasma Process

摘要

Devices and methods for monitoring a discharge in a plasma process are provided. An example method includes detecting at least a first signal path of at least one plasma supply signal within at least a first time range within at least one period of the plasma supply signal, detecting at least a second signal path of the at least one plasma supply signal within at least a second time range which is at the point corresponding to the first time range in at least one other period of the plasma supply signal, and generating an identification signal if the second signal path deviates by at least a distance from the first signal path. The distance has a minimum time difference and a minimum signal amplitude difference. The method enables to identify arcs in a very reliable and very rapid manner.

主权项

1. A plasma discharge monitor comprising:
a signal detector responsive to
at least a first signal path of at least one plasma supply signal within at least a first time range within at least one period of the plasma supply signal, andat least a second signal path of at least one plasma supply signal within at least a second time range located at one or more points corresponding to the first time range in at least one other period of the plasma supply signal; and an identification signal generator configured to generate an identification signal if the second signal path deviates by at least a distance from the first signal path, wherein the distance has a minimum time difference and a minimum signal amplitude difference.