MICRO PATTERNING EQUIPMENT OF 3-DIMENSION

摘要

PURPOSE: A micro patterning apparatus of 3-dimension is provided to reduce mask production costs when micro-pattern using lighotraphy is formed, and to reduce process time for pattern formation adjustment feedback according to mask errors. CONSTITUTION: A micro patterning apparatus of 3-dimension comprises a light source generating femtosecond laser(31) capable of causing two photon absorption; a laser beam control module(32) for controlling the femtosecond laser; a laser beam expander(33) for expanding the laser light outputted by the laser beam control module; a space light modulator(35) permeating hologram phase to the expanded laser light by applying a light-modulating; a back mirror(36) which outputs by reflecting the transmitted modulated light; a high aperture microscope lens(37) for forming the focus of reflection light reflected from the back mirror; a glass substrate(39) in which an image is formed by the focus; a two-photon absorbing polymer resin(40) for forming micro-pattern on the glass substrates; a stage(38) which moves the glass substrates in an Z-axis; and a control computer(34).