| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of detecting particles in liquid immersion fluid in a lithography device or in liquid immersion fluid from the lithography device. <P>SOLUTION: The method includes, using a vacuum system, extracting a sample from a single phase flow of liquid immersion fluid of a fluid handling structure of a lithography device or from a fluid handling structure. The method includes detecting particles in a sample, and when detected particles exceed a particular threshold, starting a signal. <P>COPYRIGHT: (C)2010,JPO&INPIT |
