| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve position accuracy and dimensional accuracy in pattern transfer by suppressing the distortion of a reticle caused by vacuum adsorption from the lower surface side of the reticle (an original). <P>SOLUTION: A reticle stage 51 which is a holding mechanism of an original (a reticle 41) includes an adsorption chuck 45 which is an adsorption mechanism for adsorbing and fixing the side surface of the reticle 41 and a holding pin 44 which is a support mechanism arranged on the lower surface side of the reticle 41. <P>COPYRIGHT: (C)2010,JPO&INPIT |
