| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymerizable composition having high curing sensitivity, with which a high-precision light-shielding film pattern can be formed while preventing the decrease in the light-shielding performance in a peripheral portion and the generation of residual matter in an unexposed portion, and moreover, the polymerizable composition being useful for forming a light-shielding film for a solid-state image sensor. <P>SOLUTION: The polymerizable composition contains (A) a polyfunctional monomer having an acid group in the molecule and/or a polymerizable compound having a different structure from that of the polyfunctional monomer having an acid group in the molecule, (B) a photopolymerization initiator, and (C) a titanium black dispersion. <P>COPYRIGHT: (C)2010,JPO&INPIT |
