发明名称 THIN FILM MANUFACTURING APPARATUS, THIN FILM MANUFACTURING METHOD, THIN FILM SOLAR CELL MANUFACTURING APPARATUS, AND THIN FILM SOLAR CELL MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a thin film manufacturing apparatus capable of suppressing mixing of an undesired impurity. <P>SOLUTION: The thin film manufacturing apparatus includes a vacuum container 11, a high-frequency antenna 13 provided in the vacuum container 11, a substrate holding unit 19 provided in the vacuum container 11 apart from the high frequency antenna 13, a plasma generating gas supply port 14 provided nearby the high frequency antenna 13, a main material gas supply port 15 provided between the plasma generating gas supply port 14 and substrate S, and doping gas supply ports 16 and 17 provided between the plasma generating gas supply port 14 and substrate S and between the main material gas supply port 15 and substrate S. The doping gas supply ports 16 and 17 are closest to the substrate S and then a doping gas is prevented from flowing backward to the antenna side, so a doping atom is prevented from sticking on the antenna etc. Consequently, the mixing of an undesired doping material as an impurity is suppressed. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2009267261(A) 申请公布日期 2009.11.12
申请号 JP20080117733 申请日期 2008.04.28
申请人 EBATEKKU:KK;SETSUHARA YUICHI 发明人 SETSUHARA YUICHI;INO EIJI;ISHIHARA SHUNICHI;WATANABE AKIRA
分类号 H01L21/205;C23C16/455;C23C16/509;H01L31/04 主分类号 H01L21/205
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