发明名称 ETCHANT PREPARATION EQUIPMENT AND ETCHANT CONCENTRATION MEASURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide etchant preparation equipment for preparing an etchant of aluminum with constant concentrations of nitric acid, moisture, phosphoric acid and acetic acid in a use site of a semiconductor manufacturing factory and a flat panel display manufacturing factory. SOLUTION: The etchant preparation equipment includes a conductivity meter for detecting conductivity of a diluted solution containing the etchant in a preparation reservoir diluted with pure water or an absorptiometer for detecting a concentration of nitric acid of the etchant, an absorptiometer for detecting a moisture concentration of the etchant, an absorptiometer or a densimeter for detecting a concentration of phosphoric acid of the etchant, a component concentration calculating means for calculating a component concentration of the etchant by a multi-component calculation method from a conductivity value of the conductivity meter for detecting the concentration of nitric acid, an absorbency value of the absorptiometer for detecting the moisture concentration, an absorbency value of the absorptiometer for detecting the phosphoric acid concentration or a density value of the densimeter, and a liquid supply means for supplying at least one of a single-acid stock solution, a mixed-acid stock solution and pure water to the preparation reservoir. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009266893(A) 申请公布日期 2009.11.12
申请号 JP20080111575 申请日期 2008.04.22
申请人 HIRAMA RIKA KENKYUSHO:KK 发明人 NAKAGAWA TOSHIMOTO;SATO HISAKUNI
分类号 H01L21/306;C23F1/08;C23F1/20 主分类号 H01L21/306
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