| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate-treating device capable of preventing an atmosphere including liquid medicine mist in a storage member from being diffused into a treatment chamber. Ž<P>SOLUTION: In a treatment chamber 2, a wafer rotating mechanism 3 for holding a wafer W is provided in a state where the wafer rotating mechanism 3 is stored in a cup 8. At an upper end of the cup 8, a curtain formation nozzle 30 is provided. Also, in the treatment chamber 2, a moving nozzle 14 for supplying SPM to the surface of the wafer W is provided. While supplying the SPM at least to the surface of the wafer W, a water curtain WC is formed at an upper portion of the cup 8, and the internal space of the water curtain WC including the internal space of the cup 8 is cut off from the external space of the water curtain WC by the water curtain WC. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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