发明名称 PHOTOIRRADIATION APPARATUS, CRYSTALLIZATION APPARATUS, CRYSTALLIZATION METHOD, AND DEVICE
摘要 <p>PURPOSE: A light irradiation apparatus, a crystallization apparatus, a crystallization method, and a device are provided to implement uniformity of mobility between TFTs and improve the mobility of the TFT. CONSTITUTION: A light irradiation apparatus includes a light modulation device, an illumination system, and an imaging optical system. The light modulation device modulates the phase of the light. The illumination system illuminates the light modulation device. The imaging optical system forms light intensity distribution(103) on a band repetition area adjacent to barriers on an amorphous semiconductor layer by irradiating the phase modulated light to the amorphous semiconductor layer by the light modulation device. The light intensity distribution is convex downward along the central line of one side of the band repetition area and is convex downward along the central line of long side of the band repetition area. A curved equal intensity line(102) is formed from the center of the band repetition area to the outer side of the long side direction. The pitch of one side direction of the band repetition area is below 2 um.</p>
申请公布号 KR20090117611(A) 申请公布日期 2009.11.12
申请号 KR20090032303 申请日期 2009.04.14
申请人 ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO.,LTD. 发明人 YUKIO TANIGUCHI;MASAKIYO MATSUMURA;TAKAHIKO ENDO;KAZUFUMI AZUMA
分类号 H01L21/027 主分类号 H01L21/027
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