| 摘要 |
<p>PURPOSE: An immersion lithography apparatus, a drying device, an immersion metrology apparatus, and a method for manufacturing a device are provided to remove the liquid from a surface of a substrate and stabilize the meniscus. CONSTITUTION: A lithography apparatus includes a substrate table and a liquid handling structure(12). The substrate table(WT) maintains a substrate(W). The liquid handling structure is arranged to remove the liquid from the substrate table, the substrate on the substrate table, or the surface of the substrate table and the substrate. The liquid handing structure has an array of the liquid extracting openings arrange along the line. Each liquid extracting opening is elongated to each extension direction. The extension direction makes a larger angle than 0 with the line.</p> |
