| 发明名称 |
Composition for forming inorganic pattern and method for forming inorganic pattern using the same |
| 摘要 |
<p>Disclosed herein is a composition for forming an inorganic pattern, comprising an inorganic precursor, at least one stabilizer selected from ²-diketone and ²-ketoester, and a solvent. Use of the composition enables efficient and inexpensive formation of an inorganic micropattern.</p> |
| 申请公布号 |
EP2116899(A2) |
申请公布日期 |
2009.11.11 |
| 申请号 |
EP20080163689 |
申请日期 |
2008.09.04 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHA, SEUNG NAM;KANG, DAE JUN;SONG, BYONG GWON |
| 分类号 |
G03F7/00;H01L21/027 |
主分类号 |
G03F7/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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