Preparation of metal oxide thin film via cyclic CVD or ALD
摘要
A cyclic deposition process to make a metal oxide film on a substrate, which comprises the steps: introducing a metal ketoiminate into a deposition chamber and depositing the metal ketoiminate on a heated substrate; purging the deposition chamber to remove unreacted metal ketominate and any byproduct; introducing an oxygen-containing source to the heated substrate; purging the deposition chamber to remove any unreacted chemical and byproduct; and, repeating the cyclic deposition process until a desired thickness of film is established.
申请公布号
EP2116633(A1)
申请公布日期
2009.11.11
申请号
EP20090005251
申请日期
2009.04.09
申请人
AIR PRODUCTS AND CHEMICALS, INC.
发明人
KIM, MOO-SUNG;LEI, XINJIAN;SPENCE, DANIEL P.;YANG, SANG-HYUN