| 摘要 |
<p>PURPOSE: A super resolution digital lithography is provided to implement digital mask data with a software method by forming a projection structure of uniform super resolution using beams projected to a substrate. CONSTITUTION: A lattice length, a target resolution, and an image angle are set(3110). The minimum value of the standard lattice value is calculated using the lattice length and the target resolution and is set the standard lattice value(3210). A scan resolution is calculated using the image angle and the standard lattice value(3310). A super resolution is calculated using the lattice length, the standard lattice value, and the scan resolution(3410). The scan ratio is set as an integer than 1 and the scan resolution(3510). A scan pitch is calculated by multiplying the super resolution by the scan ratio(3610).</p> |
