发明名称 Method and apparatus for thermal development with a non-rotating supporting surface for a development medium
摘要 <p>This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface..</p>
申请公布号 EP1624344(A3) 申请公布日期 2009.11.11
申请号 EP20050016757 申请日期 2005.08.02
申请人 E.I. DU PONT DE NEMOURS AND COMPANY 发明人 HACKLER, MARK A.;KANNURPATTI, ANANDKUMAR R.;MCMILLEN, ROBERT A.;SCHESKE, TODD M.
分类号 G03F7/36 主分类号 G03F7/36
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