发明名称 |
Method and apparatus for thermal development with a non-rotating supporting surface for a development medium |
摘要 |
<p>This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface..</p> |
申请公布号 |
EP1624344(A3) |
申请公布日期 |
2009.11.11 |
申请号 |
EP20050016757 |
申请日期 |
2005.08.02 |
申请人 |
E.I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
HACKLER, MARK A.;KANNURPATTI, ANANDKUMAR R.;MCMILLEN, ROBERT A.;SCHESKE, TODD M. |
分类号 |
G03F7/36 |
主分类号 |
G03F7/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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