发明名称 |
METHOD FOR COMPENSATING DEFOCUS OF WAFER LEVEL CAMERA MODULE |
摘要 |
PURPOSE: A method for correcting defocus of a wafer level camera module is provided to improve yield of the wafer level camera module by selective injecting and adhering a spacer wafer with the height considering the deflection of BFL(Back Focal Length). CONSTITUTION: A BFL value of a lens wafer is obtained by measuring a BFL value of a unit lens(L) comprising a lens wafer(10). A spacer wafer(20) with the height compensating for the defocus by corresponding to the BFL value of the lens wafer is prepared. The spacer wafer is inserted and adhered between a lens wafer and a sensor wafer(30). The laminated wafers are diced and separated to unit camera module. The average value or central value of the BFL values of the measured unit lens is used as the BFL value of the lens wafer. A light receiving unit(40) and a transparent material(50) sealing the light receiving unit are equipped in the upper side of the sensor wafer.
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申请公布号 |
KR20090116116(A) |
申请公布日期 |
2009.11.11 |
申请号 |
KR20080041842 |
申请日期 |
2008.05.06 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
LEE, DONG WOO |
分类号 |
H01L27/146;H01L27/14 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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