发明名称 |
Optical metrology optimization for repetitive structures |
摘要 |
An optical metrology model for a structure to be formed on a wafer is developed by characterizing a top-view profile and a cross-sectional view profile of the structure using profile parameters. The profile parameters of the top-view profile and the cross-sectional view profile are integrated together into the optical metrology model. The profile parameters of the optical metrology model are saved.
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申请公布号 |
US7616325(B2) |
申请公布日期 |
2009.11.10 |
申请号 |
US20080140627 |
申请日期 |
2008.06.17 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
VUONG VI;BAO JUNWEI;BISCHOFF JOERG |
分类号 |
G01B3/22;G01B11/24;G01B11/30;G01B13/16;G01B15/04;G01B17/06;G01B21/20 |
主分类号 |
G01B3/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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