发明名称 Photoresist composition and method of manufacturing a color filter substrate by using the same
摘要 A photoresist composition includes a coloring agent, a binder resin, a cross-linker, a photo-polymerization initiator and a solvent. The coloring agent includes an anthraquinone-based dye and a pigment. A color filter formed from the photoresist composition has a relatively greater light-transmittance. Thus, a contrast of a display apparatus having the color filter may be improved.
申请公布号 US7615322(B2) 申请公布日期 2009.11.10
申请号 US20070821411 申请日期 2007.06.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KWON SE-AH;HUH CHUL;KIM JIN-SEUK;KIM BYOUNG-JOO
分类号 G03F7/004;G02B5/20;G02B5/22;G03F7/032;G03F7/30 主分类号 G03F7/004
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