EPITAXIAL WAFER AND METHOD FOR MANUFACTURING THE SAME,申请号KR20070089585-传众专利搜索

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发明名称	EPITAXIAL WAFER AND METHOD FOR MANUFACTURING THE SAME
摘要
申请公布号	KR100925359(B1)	申请公布日期	2009.11.09
申请号	KR20070089585	申请日期	2007.09.04
申请人		发明人
分类号	H01L21/20	主分类号	H01L21/20
代理机构		代理人
主权项
地址

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