发明名称 VAPOR DEPOSITION APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus capable of reliably removing impurities. Ž<P>SOLUTION: The vapor deposition apparatus comprises a chamber body 12 the inside of which is evacuated and in which a substrate 11 to be processed is arranged, vessels 21, 26 for storing a material for vapor deposition, a heating means 30 for heating the material for vapor deposition, chambers 41, 42 for vapor deposition sources adjacently arranged in the chamber body 12, and the inside of which is evacuated and opened to the atmosphere, and in which the vessels 21, 26 are arranged, opening/closing members 43, 44 for making the inside of the chamber body connect/disconnect with/from the insides of the chambers 41, 42 for vapor deposition sources when the opening/closing members are opened/closed, a first exhaust means 50 connected to the chamber body 12, and a second exhaust means 55 connected to the chambers 41, 42 for vapor deposition sources. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009256710(A) 申请公布日期 2009.11.05
申请号 JP20080105516 申请日期 2008.04.15
申请人 SEIKO EPSON CORP 发明人 AKAGAWA TAKU
分类号 C23C14/24 主分类号 C23C14/24
代理机构 代理人
主权项
地址